Fabrication and Characteristics of RF Magnetron Sputtered ITO Thin Films
نویسنده
چکیده
Indium tin oxide (ITO) films have been deposited onto glass substrates by ifmagnetron sputtering without insitu substrate heating. The as-deposited films have an electrical resistivity of 5x1O a-cm, visible transmittance of about 85%, and infrared (IR) reflectance of above 80% at 5 jim. The effect of sputtering parameters on the deposition rate and the electrical and optical properties of ITO films are investigated. Loss of transmittance or blackening for ITO films prepared at high spuuering power are observed and explored.
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